Plasma Etch Controller Purpose The Plasma Etch Controller skill provides comprehensive plasma etching process control for nanofabrication, enabling anisotropic pattern transfer with optimized selectivity, profile control, and minimal damage. Capabilities - Etch chemistry selection - Anisotropy and selectivity optimization - Endpoint detection - Profile and sidewall angle control - Loading effect compensation - Plasma damage assessment Usage Guidelines Plasma Etch Process 1. Chemistry Selection - Match chemistry to material - Consider selectivity requirements - Address sidewall passivation 2.…